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Furnace

TF1400 Vacuum tube furnace

1400 ℃ tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research instit

Date：2023-05-22Model：TF1400Visits：720
BAF1700 Amtosphere Furnace

The furnace body of the 1700℃ chamber atmosphere furnace has a flange-type sealed structure. During the heat treatment of materials, protective gases such as nitrogen, argon, and oxygen can be introduced into the heat treatment of carbon materials, metal

Date：2023-05-23Model：BAF1700Visits：675
BF1700 Muffle Furnace

1700℃ muffle furnace (box-type resistance furnace) is used in sintering and sintering of ceramic materials, nanomaterials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research institutes, fac

Date：2023-05-23Model：BF1700Visits：704
TF1700 Vacuum tube furnace

1700℃ single-zone tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific rese

Date：2023-05-22Model：TF1700Visits：1686
TF1200 ℃ CVD Tube Furnace

1200°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo

Date：2023-05-23Model：TF1200 CVDVisits：735
BF1800 Muffle Furnace

1800℃ muffle furnace (box-type resistance furnace) is used in sintering and sintering of ceramic materials, nanomaterials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research institutes, fac

Date：2023-05-23Model：BF1800Visits：845

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